Eikon - Internationale Zeitschrift fr Photographie und Medienkunst
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LensCulture Exposure Awards 2020 Now Open!


Einsendeschluss: 11.12.2019

We are seeking the best new photography from around the world for the LensCulture Exposure Awards 2020. Since 2008, this award has offered significant exposure to more than 300 emerging and established photographers. We’re eager to discover more diverse and talented image-makers to add to this impressive cohort.

This year, the following industry experts join our international jury: Paul Schiek (TBW Books), Paul Moakley (TIME Magazine), Gwen Lee (Singapore International Photography Festival), Rebecca McClelland (Saatchi & Saatchi), Ada Takahashi (Robert Koch Gallery), Mee-Lai Stone (The Guardian), Mirjam Cavegn (Bildhalle Gallery), and Jim Casper (LensCulture).

Winners will enjoy career-changing opportunities including an exhibition in NYC this April coinciding with the Paris Photo New York photography fair. Other award benefits include cash prizes, publication in The Best of LensCulture - Volume 4, projection at international photo festivals, industry and online exposure, and more!

Get your submissions in early and take advantage of our free entry offer (ends 27 November 2019) and don’t forget, series or 5+ images entries into this award will qualify for a free written submission review of your work.

Are you ready to launch head-first into 2020? The winners of these awards will be announced early in the new calendar year, so get your entries together for the chance to start your year with the wind in your sails.

As always, this award is open to photographers of all ages, working in any location, in any genre of photography. Good luck!


Deadline: Wednesday 11 December, 2019
Free Entry Deadline: 27 November, 2019